Brussels, 29/09/2010 (Agence Europe) - On Wednesday 29 September, the European Commission authorised the Netherlands to grant €15.6 million of soft loans and a direct grant of €5.7 million to Mapper Lithography B.V, for the development of “E-beam lithography”. E-beam technology is an innovative research path that could enable the global semiconductor industry to keep increasing the performance of microchips. The Commission therefore concluded that the positive effects of the aid outweigh any potential distortion of competition. The Commission also found the aid to be compatible with the EU framework for state aid for research, development and innovation. Mapper would not have been able to carry out this risky R&D-project without the aid. In particular, the aid addresses a specific failure of the private venture capital market and is limited to the necessary minimum. Part of the aid will be granted after the final approval of the Commission, whereas another part has been granted since late 2007, according to the project-progress milestones. (I.L./transl.fl)